C E Ferulic Vitamin C Face Serum

$258.00

Description

C E Ferulic is a high-potency antioxidant serum designed to support visible skin clarity, firmness and overall resilience.

Formulated with 15 percent pure vitamin C (L-ascorbic acid), 1 percent vitamin E (alpha tocopherol) and 0.5 percent ferulic acid, this advanced combination helps defend the skin against environmental stressors such as UV exposure and pollution.

Environmental factors generate free radicals within the skin. Over time, this oxidative stress contributes to visible changes including uneven tone, fine lines and reduced firmness. Antioxidants help neutralise these unstable molecules and support healthier-looking skin.

With consistent daily use, C E Ferulic may help to:

• Improve the appearance of fine lines
• Enhance visible skin brightness
• Support a more even-looking skin tone
• Strengthen the skin’s defence against environmental stress

Suitable for normal, dry, combination and sensitive skin types. Paraben-free.

This formula remains active within the skin for up to 72 hours after application, providing ongoing antioxidant support as part of your morning routine.

For best results, we recommend using under daily sunscreen as part of a personalised skin plan.

The Science Behind C E Ferulic

Skin exposed to UV radiation, pollution and environmental metals experiences oxidative stress. This process contributes to visible ageing and uneven skin quality. Vitamin C is a well-researched antioxidant known to:

• Support collagen health
• Improve visible luminosity
• Assist in reducing the appearance of photoageing

How to Use

After cleansing, apply 4 to 5 drops to dry skin across the face, neck and chest. Allow absorption before layering additional serums or moisturiser.

Always follow with broad spectrum sunscreen during the day. One bottle typically lasts approximately three to four months with daily use, depending on application amount.

Reviews

There are no reviews yet.

Be the first to review “C E Ferulic Vitamin C Face Serum”

Your email address will not be published. Required fields are marked *